ITO Substrates( Indium Tin Oxide)


Size :100×100mm
Number of measurement :9points(Refer to figure 1)
UV cleaning equipment :ASM1101N
Irradiation time :180second
Irradiation distance :30mm
Contact angle meter :B100
Liquid drop volume :0.5μL
UV irradiation measurement position
Figure 1 Measurement points

Measurement data after 2 sec. of liquid drop(ITO Substrates
Measurement point 1 2 3 4 5 6 7 8 9 Average Standard deviation
Before cleaning 82.87 83.95 89.22 84.31 84.15 88.92 89.41 86.47 84.10 85.93 2.61
After cleaning 15.92 18.76 20.23 18.21 18.32 18.43 17.41 19.28 17.95 18.28 1.20

Irradiation distance and Irradiation time transition data
Irradiation time [sec] 0 30 60 90 120 150 180 240 300
Irradiation distance 10mm 87.13 64.38 23.64 19.79 18.27 16.73 16.27 16.53 14.28
Irradiation distance 30mm 87.13 63.33 51.00 16.57 15.84 20.27 17.00 14.80 20.98
Irradiation distance 50mm 87.13 72.36 61.09 27.96 29.51 30.00 19.91 17.78 15.11

照射距離及び照射時間推移データ ITO基板


SiC wafer

Size :Φ104mm
Number of measurement :5 points (Refer to figure 2)
UV cleaning equipment :ASM1101N
Irradiation time :300秒
Contact angle meter :B100
Liquid drop volume :0.5μL
SiC wafer UV surface modification position data
Figure 2 Measurement points

Measurement data after 2 sec. of liquid drop(C-side
Measurement point 1 2 3 4 5 Average Standard deviation
Before cleaning 65.13 64.81 62.35 67.38 63.63 64.66 1.87
After cleaning 4.70 4.61 4.97 5.44 4.95 4.93 0.32

着液2秒後のデータ  C面 SiC

SiCウエハ改質データ C面


Measurement data after 2 sec. of liquid drop(Si-side
Measurement point 1 2 3 4 5 Average Standard deviation
Before cleaning 33.72 36.74 35.82 37.33 36.18 35.96 1.38
After cleaning 4.50 4.58 4.40 4.53 5.37 4.68 0.39

照射距離及び照射時間推移データ Si面

照射距離及び照射時間推移 接触角画像


SUS347

UV cleaning equipment :ASM1101N
UV irradiation conditions :Irradiation distance:10mm
:Irradiation time:300 seconds
Contact Angle Meter :B100
Conditions :Liquid drop volume:1μL 、Measurement data after 2 sec. of liquid drop
  1 2 3 4 5
Before cleaning 98.51 98.72 98.42 98.79 98.56
After cleaning 12.33 13.26 12.21 13.21 14.02

SUS347


Inconel 600

UV cleaning equipment :ASM1101N
UV irradiation conditions :Irradiation distance:10mm
:Irradiation time:300 seconds
Contact Angle Meter :B100
Conditions :Liquid drop volume:1μL 、Measurement data after 2 sec. of liquid drop
  1 2 3
Before cleaning 95.69 97.65 94.57
After cleaning 18.64 24.64 21.91

インコネル600


Titanium(99.5%)

UV cleaning equipment :ASM1101N
UV irradiation conditions :Irradiation distance:10mm
:Irradiation time:300 seconds
Contact Angle Meter :B100
Conditions :Liquid drop volume:1μL 、Measurement data after 2 sec. of liquid drop
  1 2 3 4 5
Before cleaning 98.25 98.23 97.68 97.83 98.19
After cleaning 6.16 6.47 7.04 6.48 7.17

チタン


Copper

UV cleaning equipment :ASM1101N
UV irradiation conditions :Irradiation distance:10mm
:Irradiation time:300秒
Contact Angle Meter :B100
Conditions :Liquid drop volume:1μL 、Measurement data after 2 sec. of liquid drop
  1 2 3 4 5
Before cleaning 104.41 103.27 103.04 103.77 105.71
After cleaning 24.83 26.74 27.55 27.00 26.46

銅


Neodymium magnet

Material type :HXN5-1
Size :φ5mm
Number of measurement :2points
UV cleaning equipment :ASM1101N
UV irradiation distance :30mm
Contact angle meter :B100
Liquid drop volume :0.5μL

ネオジム

Time [sec] 0 30 60 90 120 300 480 600
Contact angle(°) 98.78 85.08 78.34 75.09 68.35 42.99 42.06 37.35

ネオジム


Aluminum A5052 Surface white alumite treatment

Size :φ112mm
Number of measurement :5ポイント
UV cleaning equipment :ASM1101N
Irradiation distance :30mm
Contact angle meter :B100
Liquid drop volume :1.0μL

アルマイト

Time [sec] 0 30 60 90 120 300 480
Contact angle(°) 76.20 66.70 53.40 56.37 43.58 24.34 17.44

アルミニウム


Soda-lime glass

Manufacturer :Matsunami Glass Ind.,Ltd.
Type :S1226
Size :76×26mm
Number of measurement :5 points
UV cleaning equipment :ASM1101N
Irradiation distance :30mm
Contact angle meter :B100
Liquid drop volume :1.0μL

アルミニウム

Time [sec] 0 30 60 90 120 180 300 480
Contact angle(°) 43.42 39.65 45.01 42.04 23.17 22.38 15.72 4.17

ソーダ石灰硝子


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